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National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | 3 months ago
. Description: This project involves the development of new technologies for ultraviolet (UV) instrumentation and systems. Successful candidates will utilize thin-film processing and nanoscale interface
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computational approaches for growing physical materials with a focus on developing atomic layer processing ferroelectric thin films and their integration with devices. Emphasis will be placed on understanding
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through the design and synthesis of nanoscale epitaxial oxide thin films. This position supports a three-year Laboratory Directed Research and Development (LDRD) project focused on developing scalable
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the laser-induced breakdown spectroscopy, high-order harmonic generation in laser-induced plasmas, gases, and solids, low-order nonlinear optical characterization of quantum dots, thin films, and other
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. It is meriting to have one or more of the following skills: General skills in the manufacture and characterization of thin-film samples, e.g. spin coating, physical vapor deposition, spray coating
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time-resolved hard X-ray diffraction microscopy and spectroscopy on single-crystalline bulk and thin film quantum materials (e.g. ferroelectrics, multiferroics, strongly correlated electron systems
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, nanoindentation, or tribology testing Experience with thin films, coatings, or surface engineering/adhesion science Experience mentoring students Record of peer-reviewed publications Knowledge, Skills, and
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to be developed: Implement and optimize inkjet printing processes using Fujifilm Dimatix printers, both in ambient and inert conditions. Optimize photochromic films printed on various substrates
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Laboratory (ORNL). As part of our research team, you will closely collaborate with a team that includes condensed matter theorists, experts in neutron/X-ray scattering, and experts in thin film and single
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, thin films, microfabrication, or related device physics Experience with multiphysics modelling or experimental design of studies Familiarity with calibration, metrology, or uncertainty evaluation Prior