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operating in Reflection In this project, the researcher will explore high-resolution interference lithography processes for the generation of polarization converters with diffraction-limited performance
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, with experience form at least two of the following areas: electrical/electronic measurements, optical/e-beam lithography, biology/biochemistry and finite element analysis/ADS/EMPro. Applications from
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for scalable fabrication technologies which poses a critical challenge: connectivity is needed in 3D while conventional lithography is intrinsically 2D. Ultra-fast direct laser writing uses femtosecond pulses
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comprehensive training in IEMN's cleanroom facilities. The cleanroom work will rely on process modules including molecular beam epitaxy (MBE), dielectric deposition (PECVD and/or sputtering), optical lithography
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cleanroom fabrication (lithography, etching, metallization). Conduct electrical and optical characterization of Si, PCD and SiC resonators. Work closely with a postdoctoral researcher to support validation
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skills and previous experience in: i) microfabrication using soft lithography techniques and femtosecond laser–induced chemical etching (FLICE); ii) characterization of flows in microfluidic channels using
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. in Physics, Materials Science, Electrical Engineering, or a related field by the start date. Preferred Qualifications: Hands-on experience in nanofabrication techniques (e.g., electron-beam lithography
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experience in one or more of the following areas: Optical sensing, photonics, or light-based micro-scale actuation Micro- and nano-fabrication (e.g., lithography, thin-film processing, MEMS, micro-assembly
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Research Assistant/Associate in Photonics Integration of Graphene and Related Materials (Fixed Term)
nanofabrication including, e-beam lithography and laser writing, on-chip optical and electrical characterizations, pump-probe and fast electro-optical measurements. Preference will be given to candidates with
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of high‑tech system design—such as the design of lithography machines—can already be automated, current design‑automation tools remain limited to specific domains or subsystems. Given the growing complexity