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chain: growth of ferroelectric thin films and 2DEGs (PLD, sputtering), nanofabrication in a cleanroom environment (UV and/or e-beam lithography), and electrical characterization (transport and
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. Extension may be possible contingent upon future funding. Previous hands-on experience with semiconductor device fabrication is required. Experience working with high resolution e-beam lithography, optical
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antennas. These films will be synthesized electrochemically or by optical lithography. - Decoration of the gold films with electrocatalysts via electrochemical methods: the catalysts will be chosen according
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or optical lithography Dry and wet etching Microwave resonator design and characterization RF and microwave measurement techniques Job Family Postdoctoral Job Profile Postdoctoral Appointee Worker Type Long
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(KIDs) Experience with cleanroom microfabrication processes, including thin-film deposition (e.g., magnetron sputtering), electron-beam or optical lithography, and dry/wet etching Familiarity with
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learning simulations - Growth of metallic heterostructures by sputtering / ALD - Optical and e-beam lithography - Ion beam and reactive etching - Fabrication of skyrmion based nano-devices - Electrical
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interest in working in a cross-disciplinary environment: Micro- and nanofabrication specialist – expertise in clean-room processing, lithography, etching, microfluidic integration, and planar waveguide
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working in a cross-disciplinary environment: Micro- and nanofabrication specialist – expertise in clean-room processing, lithography, etching, microfluidic integration, and planar waveguide fabrication
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. Experience with phase retrieval algorithms, clean room use and e-beam lithography are beneficial. The candidate will be expected to participate at international user facilities and thus will be expected
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of Research ExperienceNone Research FieldTechnologyYears of Research ExperienceNone Additional Information Eligibility criteria - Lithography techniques in clean room - Magnetism and magnetic sensors