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, Riethmann T, Feistel R, Harvey AH: New Equations for the Sublimation Pressure and Melting Pressure of H2 O Ice. The Journal of Physical and Chemical Reference Data 40: 043103, 2011 Outcalt SL, Laesecke AR
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supports US Semiconductor Manufacturing in overcoming various qualitative and quantitative measurement challenges especially over large areas, as is needed for effective manufacturing process control
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signal processing, fabrication, materials characterization, ultrasound physics, and fabrication. Qualified candidates will have some of these skills and be willing to learn. N.Orloff, J. Booth, et al
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its microscopic geometry, incorporating a wide variety of physical phenomena and using a modular structure that allows new physics to be added easily. More information is available at http
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RAP opportunity at National Institute of Standards and Technology NIST Micro- and Nano-Optomechanical Systems Location Physical Measurement Laboratory, Quantum Measurement Division opportunity
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RAP opportunity at National Institute of Standards and Technology NIST Metrology for Semiconductor Manufacturing Location Physical Measurement Laboratory, Sensor Science Division opportunity
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RAP opportunity at National Institute of Standards and Technology NIST Interface Engineering: Using Surface Chemistry to Impart Desired Properties Location Physical Measurement Laboratory
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further enriches the available data from which material behavior can be extracted. Separate work is being done to develop robust algorithms to quantitatively compare the physical and simulated experimental
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digital models through an additive process. AM enables the rapid production of complex parts with minimal lead time, fewer constraints, and reduced assembly requirements. This makes it an attractive option
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measurements from incident electrons through to detected X-rays Spectrum processing (particularly low energy lines) Weights of lines and other critical physical parameter measurements Measurement optimization