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of residence: OTHER Eligibility of fellows: nationality/ies: OTHER Selection process Comparative evaluation procedure based on qualifications and interview Additional comments Contact email
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Inria, the French national research institute for the digital sciences | Villeneuve la Garenne, le de France | France | 3 days ago
to vocational training Social security coverage 2 788 € Monthly Gross Salary Selection process Please send your CV and Cover letter Website for additional job details https://jobs.inria.fr/public/classic/en
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sought. The work may continue by applying the trained AI models to entire mountain ranges. Where to apply E-mail job-ref-5g3um31oke@emploi.beetween.com Requirements Research FieldComputer scienceEducation
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consolidating the initial discovery and is looking for a highly motivated and driven postdoctoral researcher in the area of colloid physics to contribute strongly to ongoing discoveries on the electrosolvation
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10 Apr 2026 Job Information Organisation/Company Università degli studi di Firenze - Unità di Processo Research Field Physics Researcher Profile Recognised Researcher (R2) Leading Researcher (R4
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the following: Ensure you have all necessary documents available when starting the application process. You can review the additional job description section on postings for documents that may be required. Prior
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from the selection process. The CVs will be assessed according the following general criteria: The maximum score for the candidates who accomplish all the eligibility criteria stated in the job offer
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Optoelectronic Diodes: Materials, Stability and Device Physics Description of the research project in which the research activities entrusted to the officer take place: We are seeking a Postdoctoral Research
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related to staff position within a Research Infrastructure? No Offer Description Post-doc position available in the Institute of Physical Chemistry PAS within National Science Center (NSC) OPUS 25, Project
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that are less impactful for the planet we live in. As our post-doc you will be responsible for bringing our existing microfluidic techniques to a next level, allowing their use under a wide range of process