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Description Euv lithography has become a primary manufacturing tool for the semiconductor industry, but new challenges in the development and characterization of EUV resists have emerged as the technology
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the Nanoparticle Metrology for Health and Environment Project (NMHEP), the current project is focused on identifying the primary reaction pathways that result in observed final field based endpoints by developing
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during the build process. In addition to these secondary processing mechanisms, improved control of the primary energy source for establishing the melt pool is needed to improve surface properties and
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measurements are used to monitor these surface and interfacial processes. A primary objective of our research involves characterizing surface and/or molecular chemical and structural characteristics under
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diagnostics of hot plasmas with temperatures in hundreds of thousands or millions degrees is one of the primary and sometimes the only techniques to infer plasma properties. Such hot plasmas can be found in
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, internal dynamics, materials physics and chemistry is of primary importance in determining the processing, performance and viability of advanced ceramic components such as relevant to solid oxide or hydrogen
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fire growth behavior (model validation) are maintained on the NIST Flammability Database. The primary focus of this project is to further develop and apply the tools and techniques needed to quantify
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materials. The primary focus of this work is on mechanical characterization, microstructural analysis, and finite element analysis (FEA) and artificial intelligence (AI)/machine learning (ML) modeling
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Approach, Natural Hazards Review. https://ascelibrary.org/doi/pdf/10.1061/%28ASCE%29NH.1527-6996.0000387 3. Main, J. , Dillard, M. , Kuligowski, E. , Davis, B. , Dukes, J. , Harrison, K. , Helgeson, J
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potential to become an important component in structural studies of bio-macromolecules. The main reason for its attractiveness lies in the possibility of using these data to quickly distinguish between