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Field
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• Participation in micro- and nanofabrication processes using CRHEA's state-of-the-art cleanroom facilities (advanced lithography and etching techniques) • Optical and structural characterization of fabricated
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• Participation in micro- and nanofabrication processes using CRHEA's state-of-the-art cleanroom facilities (advanced lithography and etching techniques) • Optical and structural characterization of fabricated
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. Experience with phase retrieval algorithms, clean room use and e-beam lithography are beneficial. The candidate will be expected to participate at international user facilities and thus will be expected
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National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | 2 months ago
: UV/e-beam lithography, UV imprint, Thermal/E-beam evaporation, Vapor Deposition, Reactive ion/ICP etching, dry/wet etching, Annealing, Poling, SEM, AFM, Nanophotonic design software, Comsol, Ansys
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of magnetic tunnel junctions, including PVD deposition systems, Ion Milling, Direct Write Laser Lithography, Mask Aligners, E-beam systems, CVD deposition tools, RIE tools, SEM inspection tools and metrology
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international environment along with a number of experienced colleagues. Your tasks will include: Develop prototypes of electrochemical sensors with lithography in cleanroom environment Employing different
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), optical, cryogenic, and synchrotron X-ray environments Fabricate photonic and metamaterial structures using advanced nanofabrication tools (e.g., lithography, dry etching) Contribute to the development and
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-beam lithography being an essential requirement. A willingness to work together with, and co-supervise, PhD students of the CDTR will be necessary. Contract type: Open-ended with fixed funding until 31
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setups (cryostats, superconducting detectors). Experience in cleanroom nanofabrication workflows, especially e‑beam lithography or dry etching. Knowledge of quantum information science or hybrid quantum