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polystyrene-based lithography (Prof. Michał Krupiński, Kraków, Poland) Your profile Essential PhD in physics, materials science, or related field Expertise in thin film magnetism Strong publication record
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chain: growth of ferroelectric thin films and 2DEGs (PLD, sputtering), nanofabrication in a cleanroom environment (UV and/or e-beam lithography), and electrical characterization (transport and
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. Extension may be possible contingent upon future funding. Previous hands-on experience with semiconductor device fabrication is required. Experience working with high resolution e-beam lithography, optical
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antennas. These films will be synthesized electrochemically or by optical lithography. - Decoration of the gold films with electrocatalysts via electrochemical methods: the catalysts will be chosen according
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or optical lithography Dry and wet etching Microwave resonator design and characterization RF and microwave measurement techniques Job Family Postdoctoral Job Profile Postdoctoral Appointee Worker Type Long
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Postdoc in experimental studies of phase behavior of ABC-miktoarm star block copolymers in thin f...
fundamental research focus, but thin films with tailored nano-scale structures have potential applications in e.g. nano-lithography, photonics and membranes. Responsibilities and qualifications The main
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National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | about 6 hours ago
tape-out. Extensive hands-on cleanroom fabrication experience is essential, specifically with advanced nanofabrication techniques such as Electron Beam Lithography (EBL), high-resolution photolithography
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(KIDs) Experience with cleanroom microfabrication processes, including thin-film deposition (e.g., magnetron sputtering), electron-beam or optical lithography, and dry/wet etching Familiarity with
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interest in working in a cross-disciplinary environment: Micro- and nanofabrication specialist – expertise in clean-room processing, lithography, etching, microfluidic integration, and planar waveguide
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. Experience with phase retrieval algorithms, clean room use and e-beam lithography are beneficial. The candidate will be expected to participate at international user facilities and thus will be expected