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. Experience with TEM, including Lorentz TEM and in-situ cryo experiments. Experience with nanofabrication (e.g., focused ion beam, electron-beam lithography and photolithography), transport measurements and
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experimental background in nanophotonics and optoelectronics. Experience in micro- and nano-fabrication is required. Experience with laser interference lithography and/or electron-beam lithography desired
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• Participation in micro- and nanofabrication processes using CRHEA's state-of-the-art cleanroom facilities (advanced lithography and etching techniques) • Optical and structural characterization of fabricated
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the last 0-5 years) in the field of electrical engineering, experimental physics, materials science, and mechanical engineering, or related discipline Experience in electron beam lithography and/or micro
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• Participation in micro- and nanofabrication processes using CRHEA's state-of-the-art cleanroom facilities (advanced lithography and etching techniques) • Optical and structural characterization of fabricated
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. Experience with phase retrieval algorithms, clean room use and e-beam lithography are beneficial. The candidate will be expected to participate at international user facilities and thus will be expected
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National Aeronautics and Space Administration (NASA) | Pasadena, California | United States | 3 months ago
: UV/e-beam lithography, UV imprint, Thermal/E-beam evaporation, Vapor Deposition, Reactive ion/ICP etching, dry/wet etching, Annealing, Poling, SEM, AFM, Nanophotonic design software, Comsol, Ansys
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of magnetic tunnel junctions, including PVD deposition systems, Ion Milling, Direct Write Laser Lithography, Mask Aligners, E-beam systems, CVD deposition tools, RIE tools, SEM inspection tools and metrology
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international environment along with a number of experienced colleagues. Your tasks will include: Develop prototypes of electrochemical sensors with lithography in cleanroom environment Employing different
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), optical, cryogenic, and synchrotron X-ray environments Fabricate photonic and metamaterial structures using advanced nanofabrication tools (e.g., lithography, dry etching) Contribute to the development and