Sort by
Refine Your Search
-
optimization. In this context, interdisciplinary research is strongly encouraged—particularly collaborations spanning computer science, computational linguistics, cognitive science, and the learning sciences
-
. This includes research on the optimal lithography process. Here, piecewise interference lithography will be investigated, the so called SMILE-process (Stepped Mask Interference Lithography Exposure). Objectives
-
DIPF | Leibniz Institute for Research and Information in Education contributes to addressing challenges in education through empirical research, digital infrastructure and knowledge transfer. At its
-
and simulation tool that will be developed in this project. Previous knowledge and experience in some of all of the following are desired and advantageous: high-level simulation tools (such as Gem5
-
machines are programmed for material removal. Considerable expert knowledge is required for the necessary selection of suitable production tools and the definition of tool movements. The increasing