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comprehensive training in IEMN's cleanroom facilities. The cleanroom work will rely on process modules including molecular beam epitaxy (MBE), dielectric deposition (PECVD and/or sputtering), optical lithography
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contribute in particular to the following areas: • the growth, by molecular beam epitaxy (MBE), of 2D material layers and their van der Waals heterostructures, • characterisation of the fabricated materials
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