Sort by
Refine Your Search
-
, asphaltenes, resins, and kerogen molecules and contribute to engineering design of upscaled processes. The candidate will be a part of the Applied Materials Division (AMD) within AET at Argonne and will
-
Position Requirements Recent or soon-to-be-completed PhD (within the last 0-5 years) in field of Chemistry, Chemical Engineering, Mechanical Engineering, Materials Science, Electrochemistry, or a related
-
materials from complex feedstocks to achieve the desired product quality and form. As a part of this team, you will: Apply electrochemical engineering principles to develop processes such as oxide reduction
-
the last 0-5 years) in the field of experimental nuclear physics, particle physics, electrical engineering, chemical engineering, materials science, mechanical engineering, or related discipline Ability to
-
The Argonne Leadership Computing Facility’s (ALCF) mission is to accelerate major scientific discoveries and engineering breakthroughs for humanity by designing and providing world-leading computing
-
. The successful candidate will be a key contributor to a multidisciplinary co-design team spanning material science, computing, and electronic engineering, with the goal of enabling next-generation detector
-
primary goal of this work is aimed at advancing next-generation, lithium-ion technology through a detailed understanding and mitigation of surface degradation mechanisms that limit state-of-the-art lithium
-
years) in Chemical Engineering, Environmental engineering, Bioengineering, or a closely related field, with 0 to 5 years of experience, or the equivalent experience through practical application in a
-
ceramic engineering including hands-on, practical laboratory experience with material synthesis and processing, and analytical methods. Hands-on experience: XRD & Refinement, SEM-EDX, TGA-MS, DSC, BET, coin
-
Recent or soon-to-be-completed Ph.D. in Physics, Materials Science, Electrical Engineering, or a related field Hands-on experience in epitaxial thin-film growth and characterization (oxides preferred