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The NSLS-II is seeking an exceptional Postdoctoral Research Associate to join a collaborative research effort on developing novel methods, applicable for extreme ultraviolet lithography (EUVL
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The CFN is seeking an exceptional Postdoctoral Research Associate to conduct research directed to developing state-of-the-art electron microscopy techniques particularly to probe amorphous materials
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microelectronic structures using ptychographic imaging techniques being developed at NSLS-II. The x-ray metrology pipeline will be utilized for characterization of microelectronic structures being developed at IO
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studies and computer simulations Collaborate with the BMAD development team at Cornell University by implementing new features into the code Participate in the EIC design effort in a more general sense
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development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users. Three strategic nanoscience themes underlie the CFN
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development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users. Three strategic nanoscience themes underlie the CFN
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., crowd sourced data or from mobile and distributed instrument networks) Assess the performance of next-generation predictive urban climate models using observations Develop new visualization strategies
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development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users. Three strategic nanoscience themes underlie the CFN
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the development, analysis and assessment of policies that strengthen international regimes, collecting and analyzing data to identify trends and threats to the U.S. and international communities, developing and
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for the characterization. Prepare research based manuscripts for publication Participate in the meetings related to the EFRC Required Knowledge, Skills, and Abilities: PhD in Condensed Matter Physics, Materials Science