332 embedded-system-"https:"-"https:"-"https:"-"https:"-"UCL"-"UCL" positions at NIST
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of the inflaton potential. Such experiments require even more precise measurement of the polarization of the microwave background with exquisite control of systematic errors. NIST is developing polarization
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301.975.2282 Description In too many cases, the accuracy of measurements for nuclear forensics, nuclear medicine, high-energy physics, reactor engineering, and environmental monitoring is limited by the scant
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been in development over the past 15+ years and their capabilities have grown significantly. An important effort within the LPBF community is the use of high-fidelity multiphysics models to predict melt
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The goal of metabolomics is to provide a detailed profile of the identity and concentration of metabolites in an organism at a particular point in time. Metabolomics is a relatively new discipline that
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Description The National Institute of Standards and Technology (NIST) is developing next-generation microfabricated magnetic devices and magnetic resonance imaging (MRI) contrast agents and sensors based
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, and noise measurements. References: Marsili F, Verma VB, Stern JA, Harrington S, Lita AE, Gerrits T, Vayshenker I, Baek B, Shaw MD, Mirin RP, Nam SW: Detecting single infrared photons with 93% system
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include layered semiconductors and novel 2D materials. Research is done in close collaboration with other groups at NIST with expertise in complementary techniques and materials growth. key words Time
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system. We are interested in a range of research topics, from the applied to the fundamental, covering such areas as understanding epitaxial growth of III-nitride nanostructures and development of new
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reviews. This research topic is not limited to the methods or techniques discussed below. We encourage interested researchers with diverse backgrounds and expertise in automation, mechanical
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of the semiconductor industry in the US. Numerous gases are used in the production of semiconductor chips, and the accurate metering of these gases into the process chamber is critical for maximizing device throughput