332 computational-physics "https:" "https:" "https:" "https:" "UCL" "UCL" "UCL" "UCL" positions at NIST
Sort by
Refine Your Search
-
RAP opportunity at National Institute of Standards and Technology NIST Broadband Nanoimaging of Optically Excited Free Carriers Location Physical Measurement Laboratory, Applied Physics Division
-
NIST only participates in the February and August reviews. Microwave Microfluidics is an emerging measurement and analysis approach that can quantify thermo-physical properties of solutions within
-
NIST only participates in the February and August reviews. Cavity optomechanics has been a powerful tool for investigating fundamental physics, including gravitational waves, quantum entanglement
-
the development of analytical methodologies, from both instrumentation and informatics standpoints, for the multifaceted and convoluted data that are obtained from complex biological, chemical, and forensic samples
-
of nanomaterials and chemical entities that may be bound to nanomaterials, to use analytical separation techniques and instrumental methods to characterize physical and chemical properties and compositional
-
regimes, and accurate geometry- and biochemistry-based trajectory analyses. However, detailed molecular dynamics simulations are often too time-consuming to become the basis of computational measurements
-
RAP opportunity at National Institute of Standards and Technology NIST Metrology and Prototyping of Wide-Bandgap Semiconductor Quantum Nanowire Structures and Devices Location Physical
-
provides computational resources and has an interest group for AI that regularly meets, giving the successful applicant an opportunity to interact with a variety of NIST engineers and scientists. Smart
-
process control measurements, and utilizing appropriate statistical analyses to understand the assay results and their uncertainties. This process should lead to improvements in the comparability and
-
Description Research focuses on the chemical and physical mechanisms of and in situ diagnostic development for thermal chemical vapor deposition (CVD) and atomic layer deposition (ALD), with applications in