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Description Euv lithography has become a primary manufacturing tool for the semiconductor industry, but new challenges in the development and characterization of EUV resists have emerged as the technology
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and human breath). This project focuses on the development of advanced sensing components-individually or within sensor systems-that can help to push performance to new levels, thereby impacting
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interactions with the electrolyte as a function of applied potential. Despite more than a century of model development, much is still unknown about even single-crystal interfaces. We combine spectroscopic and
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. Chemical engineers constantly need reliable property data for process design development and optimization. This information is predominantly coming from scientific publications. Thousands of papers
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focus on the development and application of new and emerging technologies to solve forensic problems and facilitate technology transitions within the forensic community. key words Sequencing; Capillary
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via Cooperative Research and Development Agreements and the AI Consortium . The selected candidate will have the opportunity to contribute to impactful tooling, guidance, research, and best practices
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time-of-flight mass spectrometric technologies. Research interests include (1) development of novel approaches for the non-target screening of environmental samples, (2) fundamental research of HRAM-MS
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characterize, manufactured particles suffer heterogeneity issues which hinder treatment efficacy and safety. To speed treatment development and improve efficacy and safety we are developing interferometric
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301 975 4364 Kathryn L. Beers kathryn.beers@nist.gov 202 578 8353 Aaron A Burkey aaron.burkey@nist.gov 301.975.4769 Sara Orski sara.orski@nist.gov 301 975 4671 Description Development of quantitative
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crystallography and spectroscopy are fundamental and imperative in the investigation and development of condensed matter sciences. We will widely use these methods to study the crystal structures of novel materials