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the "Machine Learning and Gene Regulation" team led by William Ritchie, specializing in bioinformatics and post-transcriptional regulation. The scientific environment at the IGH — international seminars, journal
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demonstrator for a Mott memory nanocrossbar based on the chalcogenide materials GaV4S8 and NiS2. It includes the development of a fabrication process for the integration of innovative nanoelectrodes, as
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Réactions et Génie des Procédés) in Nancy (University of Lorraine – CNRS), within a research environment recognized for its expertise in Process Systems Engineering (PSE) as well as in applied thermodynamics
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6 Jan 2026 Job Information Organisation/Company CNRS Department Laboratoire d'Informatique de Grenoble Research Field Biological sciences Computer science Mathematics Researcher Profile First Stage Researcher (R1) Country France Application Deadline 26 Jan 2026 - 23:59 (UTC) Type of...
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7 Mar 2026 Job Information Organisation/Company CNRS Department Laboratoire d'informatique en image et systèmes d'information Research Field Physics Researcher Profile First Stage Researcher (R1) Application Deadline 27 Mar 2026 - 23:59 (UTC) Country France Type of Contract Temporary Job...
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Description Probing neural representations of speech, in parallel with experimental phonetic analysis of the same data (collected in the field); placing the results in the context of linguistic typology. In
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analytical and bioinformatics tools to analyse and interpret data To establish workflows for the collection and analysis of samples, human stem-cell-derived brain organoids, and to develop experimental
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, Interactive and Cognitive Systems, Distributed Systems, Parallel Computing, and Networks. The host team, DAISY, is a joint CNRS, Grenoble INP, and UGA research team handling research challenges
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analytical and bioinformatics tools to analyse and interpret data - To establish workflows for the collection and analysis of samples, human stem-cell-derived brain organoids, and to develop experimental
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comprehensive training in IEMN's cleanroom facilities. The cleanroom work will rely on process modules including molecular beam epitaxy (MBE), dielectric deposition (PECVD and/or sputtering), optical lithography