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of thin, nanometer-scale films deposited on Si (and SiC) wafers. The candidate will measure and analyze these wafers using X-ray and optical methods to determine, through hybrid metrology, structural maps
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/thermal analysis, chemical analysis, electron microscopy, and structure-property relationships for complex high strength fibers as well as polymeric and composite materials. This role requires hands
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analysis, and structure-property relationships for complex polymeric and composite materials. Candidate will conduct high-level, independent research, translating cutting-edge measurements into industry
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characterizing crystallinity, molecular structure, and composition of candidate reference materials, which include irregularly shaped, polymeric particles and asymmetric materials arrays Employment Terms
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care and drug discovery. To enable such applications, we develop bioelectronics measurements to identify and quantify biomarkers in solution. Our research utilizes CMOS device structures specifically
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electron spin resonance. For more information about the group, see: https://www.nist.gov/pml/nanoscale-device-characterization-division/nanoscale-processes-and-measurements-group/scanning . U.S. Citizen