362 web-programmer-developer "https:" "https:" "https:" "https:" "https:" "https:" "University of Kent" uni jobs at NIST in United States
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existing projects in the Energy and Environment Division. References Persily A” "Challenges in developing ventilation and indoor air quality standards: The story of ASHRAE Standard 62." Building and
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the development of new expertise in acoustic measurements of fluids, from bulk samples down to the tiny volumes used in microfluidic devices. The design, fabrication, measurement, and analysis of integrated devices
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position focuses on developing measurement methodologies to characterize mechanical properties and deformation behavior in advanced packaging applications. It involves: Design, application, and evaluation
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quantities for meaningful comparison. We lead the development of innovative standards and novel calibrations to achieve accuracy in localization microscopy [1, 2], with applications ranging from nanoplastic
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in various laser-based metal additive manufacturing. The field is plagued by manufacturing errors from this uncertainty. We are looking to develop an atom-based sensor for real-time intensity
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, economics, and all branches of science. Current concerns include the development and analysis of algorithms for the solution of problems of estimation, simulation and control of complex systems, and their
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. The composition explicit distillation curve method, developed at NIST, provides a unique approach to join fuel composition with the thermophysical properties. Of critical importance is the moiety family breakdown
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viability in scaffolds as a quality attribute of a tissue engineered medical product. We will develop new methods for assessing cell viability in scaffolds that have advantages such as being label-free, non
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@nist.gov 301.975.5656 Description The Nanomaterials Research Group is interested in developing analytical methods to foster improved design of nanoparticle-based therapeutics. The design principles
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Description Euv lithography has become a primary manufacturing tool for the semiconductor industry, but new challenges in the development and characterization of EUV resists have emerged as the technology