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optimization. In this context, interdisciplinary research is strongly encouraged—particularly collaborations spanning computer science, computational linguistics, cognitive science, and the learning sciences
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. This includes research on the optimal lithography process. Here, piecewise interference lithography will be investigated, the so called SMILE-process (Stepped Mask Interference Lithography Exposure). Objectives
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, processor/system simulators (Gem5, NVSim), SystemC, HLS tools, abstractions and intermediate representations, Programming models, MLIR, LLVM, experience in code optimization, programming expertise in C, C
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