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300mm etching reactors located in CEA/Leti's clean rooms. It will involve : 1) Create the lithographic design adapted to requirements (GDS) 2) develop/optimize plasma etching processes for AlGaN and GaN
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benefiting from both academic and industrial research environments. The work will be done in collaboration with Nathalie Bertrand and Ocan Sankur (Inria DEVINE team https://devine.inria.fr/ ) and Benoît Boyer
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defined based on your profile and skills, ensuring a strong fit with the project's needs and your own expertise. As a key collaborator, you will work alongside me and two PhD students, taking the lead on
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, Uncertainty, Data SCOP: Reliability, Communication, Optimization SyRI: Robotic Systems in Interaction The recruited postdoctoral researcher will join the CID team, whose research focuses on Artificial