17 postdoctoral-image-processing-in-computer-science Postdoctoral positions at Brookhaven Lab
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. POSITION REQUIREMENTS: Required Knowledge, Skills, and Abilities: Ph.D. in Electrical Engineering, Computer Engineering, Computer Science, Physics, Material Science, or related discipline. Demonstrated
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studies and computer simulations Collaborate with the BMAD development team at Cornell University by implementing new features into the code Participate in the EIC design effort in a more general sense
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processes emerging from the unique data in research areas such as quantum information science. • You will collaborate with scientific staff with diverse backgrounds, including data analytics, electron
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found at: https://www.directives.doe.gov/directives-documents/400-series/0486.1-BOrder-a/@@images/file Equal Opportunity/Affirmative Action Employer Brookhaven Science Associates is an equal opportunity
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Space Radiation Laboratory, studying space radiation effects on living and non-living systems. JOB DESCRIPTION The Biology Department at BNL is seeking a highly motivated Postdoctoral Research Associate
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applies platforms for state-of-the-art techniques for Accelerated Nanomaterial Discovery, integrating synthesis, advanced characterization, physical modeling, and computer science to iteratively explore a
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applies platforms for state-of-the-art techniques for Accelerated Nanomaterial Discovery, integrating synthesis, advanced characterization, physical modeling, and computer science to iteratively explore a
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for highly motivated postdoctoral researchers to conduct advanced electron microscopy studies on quantum materials for neuromorphic computing. The primary objective of this research is to explore quantum
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. The program involves close collaborations with experts in theory and data science and will benefit from frequent interactions with principal investigators at the National Synchrotron Light Source II (NSLS-II
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at the Computational Science Initiative (CSI), within the Brookhaven National Laboratory. The selected candidate will collaborate on solving inverse problem, relevant for interference lithography process, by deploying