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community of users, staff, postdocs, and students. Deliver ORNL’s mission by aligning behaviors, priorities, and interactions with our core values of Impact, Integrity, Teamwork, Safety, and Service. Promote
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of physical metallurgy and mechanical behavior of materials. Basic understanding of irradiation on materials. Preferred Qualifications: Hands-on experiences in focused ion beam (FIB), transmission electron
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probing the crystalline, electronic, and magnetic properties. Your emphasis will be on the development and characterization of new material platforms to understand and control emergent phenomena in
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degradation and lifetime assessment models for high temperature materials and coatings. As a postdoc, you will employ state-of-the-art technology, research equipment and computational resources to enable
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analysis, and GPU/FPGA-based acceleration. Ability to work in a multidisciplinary team, collaborate with industry and international partners, and contribute to the design of next-generation electron imaging
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techniques to control the growth environment and material consistency across the wafer targeting applications in microelectronics and quantum information science. This position resides in the Functional Hybrid
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of correlated and topological materials. Work in thin film synthesis and physical property characterizations. Experience in user facilities. Complete data analysis of structural, electronic, magnetic, and
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various introduction systems including laser ablation. Excellent written and oral communication skills. Motivated self-starter with the ability to work independently and to participate creatively in
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. Ability to safely handle and manipulate radioactive material while preventing contamination spread. Characterization, i.e., optical spectroscopy, X-ray diffraction, scanning electron microscopic analysis
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, the importance of thoroughly understanding the physical and chemical behavior uranium hexafluoride is key, as this is currently the only material enabling enrichment for fuel elements in power reactors. This call