24 postdoc-in-thermal-network-of-the-physical-building Postdoctoral positions at Brookhaven Lab
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Apply Now Job ID JR101806Date posted 04/24/2025 Brookhaven National Laboratory (BNL) is the building site for the Electron-Ion Collider (EIC), a one-of-a-kind nuclear physics research facility
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development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users. Three strategic nanoscience themes underlie the CFN
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development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users. Three strategic nanoscience themes underlie the CFN
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development and is the nexus of a broad collaboration network. Each year, CFN staff members support the research of nearly 600 external facility users. Three strategic nanoscience themes underlie the CFN
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based on two first-of-their-kind NION scanning transmission electron microscopes. In this postdoc position, you will be a member of the Electron Microscopy group and be mentored by scientists at CFN
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of long-distance quantum networking science and technology, centered on atomic-based quantum memories and quantum repeaters, with the goal of building regional-scale quantum internet services. Active areas
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solutions to challenges influenced by meteorological conditions (contaminant dispersion, weather extremes, building design, renewable energy generation) in highly heterogeneous environments such as cities and
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of biological systems from how plants make oils and other products to the role of proteins in disease. Our work helps to develop and make use of the tools and techniques of biochemistry, molecular genetics
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The Advanced Electron Microscopy and Nanostructured Materials Group within the Division of Condensed Matter Physics and Materials Science at Brookhaven National Laboratory invites applications
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at the Computational Science Initiative (CSI), within the Brookhaven National Laboratory. The selected candidate will collaborate on solving inverse problem, relevant for interference lithography process, by deploying