23 postdoc-in-distributed-systems-and-controls Postdoctoral positions at Brookhaven Lab
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Apply Now Job ID JR101837Date posted 05/16/2025 Brookhaven National Laboratory (BNL) is the building site for the Electron-Ion Collider (EIC), a one-of-a-kind nuclear physics research facility
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for Mesoscale Transport Properties where Brookhaven National Laboratory is a participating institution. The research effort is a multi-institutional multi-disciplinary research initiative providing opportunity
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of microelectronics. This is a 2 year appointment. Essential Duties and Responsibilities: Design and fabricate test patterns and microelectronics samples for x-ray characterizations. Explore a method for producing
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of biological systems from how plants make oils and other products to the role of proteins in disease. Our work helps to develop and make use of the tools and techniques of biochemistry, molecular genetics
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radiation on both living and non-living systems. Position Description A postdoctoral position is available immediately at BNL Biology Department under the supervision of Dr. Nak Hyun Kim. This project is a
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for highly motivated postdoctoral researchers to conduct advanced electron microscopy studies on quantum materials for neuromorphic computing. The primary objective of this research is to explore quantum
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Apply Now Job ID JR101630Date posted 01/21/2025 This position is hosted by the Condensed Matter Physics and Materials Science Department, which has extensive expertise in quantum materials
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National Laboratory is committed to providing fair, equitable and competitive compensation. The full salary range for this position is $71,000 - $82,000 / year. Salary offers will be commensurate with
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of existing ones for scientific applications; (ii) Large Language Models (LLMs) and multi-modal Foundation Models (iii) Large vision-language models (VLM) and computer vision techniques; and (iv) techniques
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The NSLS-II is seeking an exceptional Postdoctoral Research Associate to join a collaborative research effort on developing novel methods, applicable for extreme ultraviolet lithography (EUVL