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the measurement of infrared radiation for applications to remote sensing, fundamental metrology, process monitoring, homeland security, defense, and biomedical areas. Specific interests include (1) the development
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process control applications in the nanomanufacturing and semiconductor industries. Our research focuses on the miniaturization of SPM sensing mechanisms (e.g., active cantilevers), high-speed MEMS scanning
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Description The National Institute of Standards and Technology (NIST) is developing next-generation microfabricated magnetic devices and magnetic resonance imaging (MRI) contrast agents and sensors based
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microscope (STEM) image. This is a fundamental transformation from the existing image acquisition paradigm and could enable new types of nano- and atomic-scale metrology. The Material Measurement Laboratory
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imaging and analysis methods, as well as collaborative efforts with other NIST laboratories for image processing and 3D visualization methods. key words Electron microscopy; Confocal microscopy
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controls the interactions of and between nanotubes dispersed for processing in liquid media. A key example of this is that liquid phase separation techniques rely on modulating these interactions using
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(for variable pressure SEM), the effect of e-beam shape on imaging, the effects of electric fields and charging, and electron detectors. key words Electron detector modeling; Electron scattering; Electron
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patient’s target cells to treat intractable diseases, such as cancer and genetic diseases. Infectious titer is a critical measurement of viral vector function and potency. Such functional measures of viral
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NIST only participates in the February and August reviews. Metals-based additive manufacturing (AM) processes, or metals 3D printing, such as laser powder bed fusion and directed energy deposition
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semiconductors (InAs quantum dots, ErAs nanoparticles) and superconductors (WSi, MoSi, NbTiN) for single-photon detectors, all of which are developed at NIST. In addition to device processing and electrical and