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Semiconductor fabrication is one of the most complex and precision-driven forms of manufacturing. At nanometre scales, even subtle variations in process conditions can introduce defects that degrade
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in process conditions can introduce defects that degrade device performance, reduce yield, and drive up production costs. Addressing this challenge requires new modelling approaches that can capture
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-integrated photonics components, novel photonic integrated circuits (PICs) for secure communication will be demonstrated. The laboratory-level development will be combined with a large-scale wafer process with
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development will be combined with a large-scale wafer process with industrial-level uniformity and spatial resolution by using the pilot 300-mm semiconductor process line available in collaboration with AIST
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either photonic structures or optoelectronic device fabrication and characterisation. Strong experimental skills in at least one of: nanofabrication, electronics, materials development and processing
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, materials development and processing, or thin-film characterisation. Ability to work collaboratively within interdisciplinary research teams. Good communication and interpersonal skills. Desirable
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including anechoic chambers and controlled experimental environments, ensuring high-quality, repeatable data. Develop and apply signal processing workflows for weak transient signals, long-term monitoring
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be considered as part of the recruitment process. For further information including key benefits designed to help maintain and support employees' well-being and work-life balance, please see our
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that applicants may seek flexible working patterns which will be considered as part of the recruitment process. For further information including key benefits designed to help maintain and support employees' well
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materials developed within the EXPRESS programme. You will design and implement fabrication process flows within a cleanroom environment, including thin film deposition, lithography, mask design and etching