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for MOCVD, ALD, and VPI processes Project Background: The atomic layer processing technologies such as atomic layer deposition (ALD) and its variant area selective atomic layer deposition (ASD) have
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for atomic-scale selective deposition processes Project Background: The atomic layer processing technologies such as atomic layer deposition (ALD) and its variant area-selective atomic layer deposition (AS-ALD
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MOCVD, ALD, and AS-ALD processes Project Background: Thin film processing technologies such as metal-organic chemical vapor deposition (MOCVD), atomic layer deposition (ALD) and its variant area-selective
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and their combination with observational data to improve the interpretation of cloud processes Coupling of cloud simulation data with detailed radiation calculation Evaluation of simulated 3D cloud
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position (65%) is offered for 3,5 years. The position is available immediately. The time limitation of the contract is based on the Wissenschafts-zeitvertragsgesetz (WissZeitVG). ISAS collects and processes
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organizational levels of the brain – from molecular and cellular processes to complex neuronal networks and behavior. The Department Cellular Neuroscience of Prof. Dr. Stefan Remy in association with the Research
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: process multisource satellite and UAV based data collected in the case study regions apply and develop models for tillage mapping and monitoring using remote sensing apply and further develop machine
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PhD Position (m/f/d) - Atomic Layer Deposition (ALD) of transition metals for biomedical application
Overview: ALD Process Development: Design and optimize novel ALD formulations for transi-tion metals, as well as modify existing ALD processes, in collaboration with our re-search partners. A particular
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. Alexander Ecker (Institute of Computer Sciences, University of Göttingen). Candidate profile We are looking for a highly motivated candidate with: A strong background in animal behavior, behavioral ecology
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description: Development of new thin film processes (via MOCVD and ALD) for the growth of metal, metal oxides, metal sulphides and metal nitrides Optimization of deposition processes to enhance the functional