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Field
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This PhD project is at the intersection of electromagnetism, numerical methods, and high-performance parallel computing, with application towards the design and optimisation of integrated circuits
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for their employability in applications. Additionally, machine learning methods need to be applicable to high-dimensional and to noisy data that are typically encountered in real-world applications. The aim of this project
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remaining functional under harsh geothermal conditions. The candidate is expected to work closely with D-TECH and may undertake a secondment period to test and apply the developed methods on industrial-scale
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in Discontinuous Galerkin Finite Element Methods and the Julia programming language will admitted to the selection. Workplan and the objectives to achieve: This scholarship aims to advance a time
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knowledge of numerical methods - knowledge of free-surface flows, granular flows - proven experience in numerical simulation (finite elements, finite volumes, CFD, LES, etc.) - proficiency in basic scientific
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Collaborative Doctoral Project (PhD Position) - AI-guided design of scaffold-free DNA nanostructures
. Such structures can be used to construct artificial cell mimics and new materials. A scaffold-free DNA tile assembly is a programmable method for the formation of two- and three-dimensional DNA structures which
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Earthquake Engineering and examines the dynamic and liquefaction behavior of Icelandic basalt sand, using laboratory test methods and advanced numerical techniques. The project is funded for three years by
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accuracy requires high spatial and temporal resolution, which is time-prohibitive and therefore impractical for large parts. This project therefore aims to develop numerical methods that enable the efficient
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associated numerical methods and AI, will be used with High Performance Computing (HPC) to improve understanding of key flow physics and inform future HPT design. Skills and Experience Required: Applicants
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Are you fascinated by electromagnetic modeling and numerical problem solving? Do you want to contribute to the development of state-of-the-art metrology for integrated-circuit production