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. The EIC will be a discovery machine for unlocking the secrets of the “glue” that binds the building blocks of visible matter in the universe. The machine design is based on the existing and highly optimized
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Tool 5 (MET5)—a 0.55 NA EUV lithography patterning beamline—at Advanced Light Source of the Lawrence Berkeley National Laboraotry. You have experience in optimizing the patterning performance of hybrid
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for neuromorphic computing applications and pulse-based electrical measurements. You have experience in optimizing 2D materials device performance via engineering materials and device physics, including contact
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lipid accumulation in plants. This evaluation involves the application of systems biology tools and isotope tracer studies to comprehensively understand and optimize lipid biosynthesis pathways
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for scientific and security applications; (ii) ML model optimization for inference speed and deployment for real-time analysis; and (iii) AI model training for analog in-memory computing. The position provides