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Eligibility criteria - Knowledge of microelectronics technologies. - Experience working in clean room environments. - Experience using electron microscopy and optionally FIB (Focused Ion Beam). - Experience in
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polarimetry for the metrology in microelectronics, studies of nanomaterials, and optical diagnosis of various biological tissue including plants. Where to apply Website https://emploi.cnrs.fr/Candidat/Offre
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Expected skills: • Microelectronic technologies (lithography, etching, material deposition, etc.) • Deposition of sensitive materials (superconductors, metal-insulator transitions, oxides, etc.) • Experience
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versatile structures with numerous applications in microelectronics, MEMS (Microelectromechanical Systems), and nanotechnology. These membranes are produced by selectively etching the top silicon layer of SOI
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- Strong experience in electrical and thermal measurement set-up; - microelectronic technologies (lithography, etching, materials deposition etc.); - manipulations and measurement in temperature regulated