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chemistry, EUV exposure mechanisms, high-resolution patterning performance, and dry-etching characteristics of the synthesized hybrid resists by utilizing electron beam lithography (EBL), low-energy electron
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interconnects, (ii) characterization of mechanical stress and radiation-damage effects in photonics components integrated on a conventional silicon substrate and (iii) preparation of samples to be used for x-ray
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research findings via paper publications and external presentations. Required Knowledge, Skills, and Abilities: You have a Ph.D. in a relevant discipline (Materials Science, Physics, Electrical Engineering
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