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PhD Position (m/f/d) - Atomic Layer Deposition (ALD) of transition metals for biomedical application
, surface-limited chemical reactions of ALD enable the growth of high-quality, high-purity metallic layers with excellent conformality, even on complex, non-planar surfaces such as dental implants. Project
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broad network in research and practice, as well as access to the GRADE continuing education program at Goethe University. We also offer you a varied and creative job in an interdisciplinary team with a
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the Leibniz Association, financed by the Federal Government and the State of Schleswig-Holstein. Our central task is basic and translational research in the field of respiratory diseases. We operate
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profile. Active participation in a large research project about the scaling of intervention studies, with a focus on mentoring for young people from disadvantaged backgrounds. the doctoral program in
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Dortmund, we invite applications for a PhD Candidate (m/f/d): Analysis of Microscopic BIOMedical Images (AMBIOM) A new project area in the institute is the development of artificial intelligence (AI
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electrophysiology starting as soon as possible for a 3-year fixed-term period (in accordance with the availability of funds) in part time 65% (26 hours per week) with a salary of TV-L E13. About the project
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Rare-Earth-Sulfide thin films with enhanced Magneto-Optical properties Project Background: Nanostructured functional materials ranging from metals, metal oxides, metal nitrides and metal sulphides
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the International Continental Scientific Drilling Program (ICDP) and aiming to study the icehouse–hothouse transition during the Permian (299–252 million years ago) and extreme continental climate states. Key
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. Our most recent project is to characterize the function and genetic control of root anatomical traits in maize to enhance drought tolerance. This PhD project is part of a large consortium, including
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for MOCVD, ALD, and VPI processes Project Background: The atomic layer processing technologies such as atomic layer deposition (ALD) and its variant area selective atomic layer deposition (ASD) have