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The NSLS-II is seeking an exceptional Postdoctoral Research Associate to join a collaborative research effort on developing novel methods, applicable for extreme ultraviolet lithography (EUVL
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ultraviolet (EUV) lithography by synthesizing organic-inorganic hybrid thin films via atomic layer deposition (ALD) techniques, especially vapor-phase infiltration (VPI). You will explore the materials
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well as associated materials and device physics. You have demonstrated experimental experience in nanofabrication processes (e.g., electron-beam lithography, physical vapor deposition, atomic layer deposition etc
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