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, electron and optical lithography, reactive ion etching, as well as surface treatment (ALD, CVD, …). Classical analysis via SEM, AFM, XPS, Raman will be required. Finally, quantum analysis is required in
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) * electromagnetic design of device using soft-ware such as comsol *clean room fabrication using both optical and e beam lithography *Optoelectronic characterization of infrared sensor (I-V, photocurrent spectrum
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