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- University of Basel
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- Prof. Dr. Ricarda Toerner
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international research institutions and stakeholders from politics, business, and society Flexible working conditions and opportunities for personal development We are actively committed to a sustainable and
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. Project background The position is associated to a project on phase-field modeling of fracture. The PhD project aims at developing cutting edge models for the fracture behavior of quasi-brittle materials
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comprising re-surveys of historical vegetation data since the middle of the 19th century. The PhD candidate will have the opportunity to develop their own research questions within this broad theme. Finally
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of Basel invites applications for a PhD position to develop and apply a “Quantum optical twist and scan microscope" – an entirely novel scanning probe instrument for nanoscale studies of emergent properties
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trapping and analysis using state-of-the-art nanopore experiments. About the Project Our group has pioneered the development of the Nanopore Electro-Osmotic Trap (NEOtrap), a groundbreaking technique that
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recruitments (summer and winter) and work closely with the Biozentrum group leaders to maintain and further develop the high-quality standards of our PhD program. You will independently organize and oversee
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will develop and apply advanced methodologies, including scenario analysis and the innovative use of satellite data, to model the exposure and vulnerability of companies to climate-related hazards (e.g
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of nanoparticles for healthcare and industrial applications. As a PhD candidate, you will: Develop and refine SAXS and FCCS methods to quantify size, concentration, density and internal structure of diverse
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with our team of experienced scientists, postdocs and PhD students, you will develop materials that contribute to the development of the next generation of sustainable biocomposite materials. This project is
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for a PhD Student in Fabrication of Quantum Devices Your tasks Development of scalable fabrication methods of quantum nanostructures and devices using EUV lithography and e-beam lithography Close