22 distributed-computing-associate-professor Postdoctoral positions at Brookhaven Lab
Sort by
Refine Your Search
-
. The program involves close collaborations with experts in theory and data science and will benefit from frequent interactions with principal investigators at the National Synchrotron Light Source II (NSLS-II
-
funding. Please contact Nak Hyun Kim (nkim@bnl.gov ) if you have any questions. BNL policy requires that after obtaining a PhD, eligible candidates for research associate appointments may not exceed a
-
research associate appointments may not exceed a combined total of 5 years of relevant work experience as a post-doc and/or in an R&D position, excluding time associated with family planning, military
-
Space Radiation Laboratory, studying space radiation effects on living and non-living systems. JOB DESCRIPTION The Biology Department at BNL is seeking a highly motivated Postdoctoral Research Associate
-
of nuclear and radioactive materials. The Nonproliferation and National Security Department seeks a Postdoctoral Research Associate with knowledge and experience in electronic circuit design and application
-
Apply Now Job ID JR101446Date posted 09/26/2024 The AI/ML Department of Computational Science Initiative (CSI) at Brookhaven National Laboratory (BNL) invites exceptional candidates to apply for a
-
Apply Now Job ID JR101405Date posted 09/12/2024 The Machine Learning Group of the Computational Science Initiative (CSI) at Brookhaven National Laboratory (BNL) invites exceptional candidates
-
associate position with a focus on natural language processing (NLP). This extremely fast-moving and competitive field has produced innovations with highly visible impact in industry, education, and public
-
associate position with a focus on national security applications of natural language processing (NLP). This extremely fast-moving and competitive field has produced innovations with highly visible impact in
-
The NSLS-II is seeking an exceptional Postdoctoral Research Associate to join a collaborative research effort on developing novel methods, applicable for extreme ultraviolet lithography (EUVL