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detection equipment to support sponsors in operation and research. In addition, the Group also works on artificial intelligence and machine learning to address questions related to detection and safeguards
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plasma reactive ion etching (ICP-RIE), and other characterization methods including transmission electron microscopy (TEM). You have demonstrated experimental experience in nanofabrication processes (e.g
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at the Computational Science Initiative (CSI), within the Brookhaven National Laboratory. The selected candidate will collaborate on solving inverse problem, relevant for interference lithography process, by deploying
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data science Reporting the scientific results in academic papers and talks Required Knowledge, Skills, and Abilities: PhD. in Physics or related discipline. A good understanding of the physics of quantum
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well as associated materials and device physics. You have demonstrated experimental experience in nanofabrication processes (e.g., electron-beam lithography, physical vapor deposition, atomic layer deposition etc
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funding. Please contact Nak Hyun Kim (nkim@bnl.gov ) if you have any questions. BNL policy requires that after obtaining a PhD, eligible candidates for research associate appointments may not exceed a
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optimization. Basic knowledge of integrated circuit design, including digital simulation and logic synthesis. methods, and other related topics pertaining to fast AI model inference. Experience working in
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annual renewal contingent on performance and funding. Please contact Jorg Schwender (schwend@bnl.gov ) if you have any questions. BNL policy requires that after obtaining a PhD, eligible candidates for
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Responsibilities: Design of high-frequency application-specific integrated circuits (ASIC) in modern CMOS process nodes (65 nm, 28 nm) Design of high-frequency printed circuit boards (PCBs) and antenna arrays
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Information: This is a 2-year Postdoc Assignment. BNL policy requires that after obtaining a PhD, eligible candidates for research associate appointments may not exceed a combined total of 5 years of relevant